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Types：
Aluminum Etching Solution, ITO Etching Solution (Oxalic Acid Series), ITO Etching Solution (Aqua Regia Series), M2, H2, etc.
Ingredients：
Phosphoric Acid, Nitric Acid, Acetic Acid, Oxalic Acid, etc.
Specifications：
Customized electronic-grade specifications according to customer requirements
Applications：
Used in panel TFT and RGB etching processes, as well as for etching metal layers such as tungsten, cobalt, and titanium nitride in integrated circuit chips
Packaging：
20L, 200L, IBC ton containers, and tanker trucks
Etching Solution
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